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and size of the photomask defects
mixed acid etchants
org in June 2007
On the other hand equipment suppliers could reduce their effort for developing and maintaining a variety of equipment communication interfaces
These would result in a multitude of interface problems
P04600 - SEMI P46 - XMLによるフォトマスクのCD計測情報データの仕様 Revision:SEMI P46-0706 - Superseded and size of the photomaskglobal Micropatterning Committeeglobal Audits and Reviews Subcommittee200651620066www. semi. org 20067CD ROM XMLCD Referenced SEMI Standards SEMI P10 Specification of Data Structures for Photomask Orders SEMI P41 Specification for Mask Defect Data Handling with Xml, Between Defect Inspection Tools, Repair Tools, and Review Tools
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